Abstract:With the continuous development of the field of information technology, there has been a demand for recording mark size of optical data storage, optical imaging resolving power, and characteristic linewidth of photolithography to reach nanoscale. However, it is very difficult to realize the goal due to the optical diffraction limit restrictions. Much interest has focused on the study of optical far-field super-resolution spot by using pupil filters. However, common concerns have continued to plague super-resolving pupil filters based on either scalar diffraction theory or vector diffraction theory. These concerns include the fact that the side lobe becomes non-negligible when the central lobe is squeezed to a certain extent. Moreover, it is difficult to reduce the super-resolving spot to nanoscale. In this work, we proposed a novel method to combine the super-resolving pupil filters with nonlinear saturable absorption thin films to reduce the central spot size to nanoscale, lower the intensity ratio of side lobe to central lobe, and elongate the depth of focus or tunable tolerance distance between the super-resolving spot and sample. The simulated results indicate that by using the three-zone annular binary phase filter as the super-resolving pupil filter and Sb2Te3 as the nonlinear saturable absorption thin films, the central spot size can be reduced to nanoscale, the side lobe intensity is squeezed to about 10% of the central lobe intensity, and the tunable tolerance distance between the super-resolving spot and the sample is about two times that of the depth of focus of the diffraction limited spot at the incident laser wavelength of 405nm and the numerical aperture of focusing lens of 0.95. The combination of the super-resolving pupil filters with the nonlinear saturable absorption thin films is very useful for nano-optical data storage, maskless nanolithography, and nano-optical imaging. It is also easy to use in actual applications because of the operation in the far-field range.

The factors of influence on quality of patterns in pupil filtering photo-lithography

Study on Improvement of Resolution in Photolithographic Patterns with Pupil Phase-Shift Filtering

Image Pre-Processing Techniques for Auto Focusing

Design of Focusing System in Laser Pattern Generator

Study of Improvement of Imaging Quality in Project Photolithography with Amplitude Phase Compound Filtering

Flexible Pupil Correction Technology for Photolithography Machine

Correction Algorithms of Pupil Aberration for Fourier Ptychographic Microscopy

Anasysis of the Key Parameters in Lithography Process

Effect of Fabrication Errors on Lateral Super-Resolution Property of A Three-Zone Pupil Filter

Improving the Edge Profiles of Lithography Patterns Using Gray-Tone Technique in Digital Photolithography

Research and Development of Superfine Pattern Lithography Technology

Optimizing Sub-resolution Assist Features Using Test Pattern Method

Performance improvement of super-resolving pupil filters via combination with nonlinear saturable absorption films

Programmable Pupil Correction Method for Photolithography Illumination System

Improved design method for suppressing optical focal spots and experimental verification

Relationship Between Ruling Quality and Lithographic Gap in Proximity Photolithography

Optimized Design of Four-Zone Phase Pupil Filter for Nanoscale Phase Transition Optical Lithography

Evaluation Algorithm of Pupil Characteristic Parameters in Lithography Illumination System

A Fast Method for Analyzing the Effect of Mask Error on Photolithography Pattern Quality

An optimized filter design approach for enhancing imaging quality in industrial linear accelerator

SIMULATION OF PATTERN TRANSFER ACCURACY OF THE DEEP UV-LITHOGRAPHY