Upgradation of high resistance CdZnTe crystal through annealing

李国强,谷智,介万奇
DOI: https://doi.org/10.3969/j.issn.1007-4252.2003.02.004
2003-01-01
Abstract:As-grown Cd0.9Zn0.1Te wafer prepared by vertical Bridgman method was annealed using Cd1-yZny alloy as source. It is found that after annealing, the concentration deviation of Zn in the radial direction decreases from 0.15at%to 0.05at%, the impurity contaminations of Al, Na, Mg and Cu are reduced to some degree, the full width at half maximum (FWHM) which indicates the crystallinity fells from 182″to 53″, the IR transmittance increases from 56.6%to 62.1%and the resistance elevates from 7.25×108Ωcm to 2.5×1010Ωcm. These changes indicate that the annealing treatment can upgrade the performance of high resistance CdZnTe in the proper circumstances.
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