CoFe2/Al2O3/PMNPT Multiferroic Heterostructures by Atomic Layer Deposition

Ziyao Zhou,Garrett Grocke,Angel Yanguas-Gil,Xinjun Wang,Yuan Gao,Nianxiang Sun,Brandon Howe,Xing Chen
DOI: https://doi.org/10.1063/1.4948977
IF: 4
2016-01-01
Applied Physics Letters
Abstract:Multiferroic materials and applications allow electric bias control of magnetism or magnetic bias control of polarization, enabling fast, compact, energy-efficient devices in RF/microwave communication systems such as filters, shifters, and antennas; electronics devices such as inductors and capacitors; and other magnetic material related applications including sensors and memories. In this manuscript, we utilize atomic layer deposition technology to grow magnetic CoFe metallic thin films onto PMNPT, with a ∼110 Oe electric field induced ferromagnetic resonance field shift in the CoFe/Al2O3/PMNPT multiferroic heterostructure. Our work demonstrates an atomic layer deposition fabricated multiferroic heterostructure with significant tunability and shows that the unique thin film growth mechanism will benefit integrated multiferroic application in near future.
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