Thermal Stability of Si-doped V 2 O 5 /WO 3 –tio 2 for Selective Catalytic Reduction of NO X by NH 3
Xun-Zhe Shao,Hong-You Wang,Meng-Long Yuan,Jie Yang,Wang-Cheng Zhan,Li Wang,Yun Guo,Guan-Zhong Lu
DOI: https://doi.org/10.1007/s12598-018-1176-x
IF: 6.318
2019-01-01
Rare Metals
Abstract:The selective catalytic reduction of NO x with NH 3 (NH 3 -SCR) is a very effective technology to control the emission of NO x , and the thermal stability of NH 3 -SCR catalyst is very important for removal of NO x from diesel engines. In this work, V 2 O 5 /WO 3 –TiO 2 (VWT) and SiO 2 -doped V 2 O 5 /WO 3 –TiO 2 (VWTSi 10 ) catalysts were prepared by impregnation method and characterized by Brunauer–Emmett–Teller (BET), X-ray diffraction (XRD), Raman, temperature programmed reduction by hydrogen (H 2 -TPR), X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption by ammonia (NH 3 -TPD). The doping of SiO 2 promotes the thermal stability of V 2 O 5 /WO 3 –TiO 2 for NH 3 -SCR significantly. After calcination at 650 °C for 50 h, the operation window of 10% SiO 2 -doped V 2 O 5 /WO 3 –TiO 2 is 220–480 °C, while the maximum NO x conversion on V 2 O 5 /WO 3 –TiO 2 is about 77%. The presence of SiO 2 obviously blocks the transformation of TiO 2 from anatase to rutile and stabilizes the dispersion of VO x and WO 3 on the surface. It is available for the existence of V 4+ and the amount of surface acid sites increases, which inhabits the NH 3 oxidation at the high temperature range and promotes NH 3 -SCR activity.
What problem does this paper attempt to address?