Full-field Fabric Stress Mapping by Micro Raman Spectroscopy in a Yarn Push-out Test.

Z. K. Lei,F. Y. Qin,Q. C. Fang,R. X. Bai,W. Qiu,X. Chen

DOI: https://doi.org/10.1364/ao.57.000924

IF: 1.9

2018-01-01

Applied Optics

Abstract:The full-field stress distribution of a two-dimensional plain fabric was mapped using micro Raman spectroscopy (MRS) through a novel yarn push-out test, simulating a quasi-static projectile impact on the fabric. The stress-strain relationship for a single yarn was established using a digital image correlation method in a single-yarn tensile test. The relationship between Raman peak shift and aramid Kevlar 49 yarn stress was established using MRS in a single-yarn tensile test. An out-of-plane loading test was conducted on an aramid Kevlar 49 plain fabric, and the yarn stress was measured using MRS. From the full-field fabric stress distribution, it can be observed that there is a cross-shaped distribution of high yarn stress; this result would be helpful in further studies on load transfer on a fabric during a projectile impact.