Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel

Jeffrey W. Elam,Joseph A. Libera,Trang H. Huynh,Hao Feng,Michael J. Pellin
DOI: https://doi.org/10.1021/jp1030587
2010-01-01
Abstract:Silica gel is a mesoporous, granular material with a high specific surface area that is widely used as a support for heterogeneous catalysts. This study explores the atomic layer deposition (ALD) of aluminum oxide (Al2O3) in silica gel. The coated materials were analyzed using weight-gain measurements, nitrogen adsorption surfacearea analysis, energy dispersive X-ray analysis, and scanning electron microscopy. In addition, the individual ALD surface reactions on the silica gel powder were monitored in situ using quadrupole mass spectrometry. This study confirmed that the silica gel could be conformally coated using reactant exposure times of similar to 90 s, and the surface area remained relatively unchanged even after 20 Al2O3 ALD cycles. MAX measurements performed on silica gel specimens prepared using subsaturating trimethyl aluminum (TMA) exposures demonstrated that the spherical particles become infiltrated with the Al2O3 ALD progressively from the outside of the particles to the core, and the kinetics of this process are dictated by the rapid consumption of TMA by the high surface area silica gel. The Al2O3 ALD is inhibited on the silica gel surface for the first similar to 5 ALD cycles, and this leads to a lower initial weight gain as well as a reduced proportion of methane released during the initial TMA exposures. This study provides useful insights into ALI) processes on high surface area supports that will be valuable for the future development of nanostructured catalysts using ALD.
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