Die Imprinting of MGs: A One-Step Approach for Large-Area Metallic Photonic Crystals

Xue Liu,Na Chen,Jia-Lun Gu,Guan-Nan Yang,G. Mussler,Ke-Fu Yao
DOI: https://doi.org/10.1016/j.matdes.2015.08.104
IF: 9.417
2015-01-01
Materials & Design
Abstract:The discovery of photonic crystals (PCs) enables the manipulation of photons and opens an avenue to design nanostructured materials for a variety of optical devices. Due to the existence of surface plasmon polariton, metallic PCs exhibit higher efficiency and better power durability. Despite this, the costly and inefficient fabricating methods severely limit their applications. In the present work, large-area metallic glass (MG) PCs consisting of uniform rods with diameter of ~350nm and height of ~100nm have been prepared through the die imprinting of Pd40.5Ni40.5Si4.5P14.5 MGs with Si templates. The prepared MG PC exhibits a periodicity of 1.580±0.002μm, and possesses very low linear shrinkage of 11nm as well as a relative linear shrinkage rate of 0.691%, which is much lower than those of the crystalline PCs under similar fabrication conditions. Uniform structural colors were observed on the surface of the MG PC under illuminating by fluorescent lamp light. Besides, polymeric PCs were successfully prepared by hot embossing from the MG PC. The die imprinting of MGs offers an inexpensive, effective and one-step approach for producing large-area and high-quality metallic PCs and may shed new insights on both scientific fundamentals and technological innovations in the PC area.
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