Influence of Halogen Atoms on the Structures and Photophysical Properties of 9,10-Distyrylanthracene (DSA)

Dong-En Wu,Man-Ning Wang,Yang-Hui Luo,Gao-Ju Wen,Bai-Wang Sun
DOI: https://doi.org/10.1039/c5ce01465d
IF: 3.756
2015-01-01
CrystEngComm
Abstract:Four DSA (9,10-distyrylanthracene) derivatives, namely 9,10-bis(4-fluorostyryl)anthracene (BFSA), 9,10-bis(4- chlorostyryl)anthracene (BCSA), 9,10-bis(4-bromostyryl)anthracene (BBSA) and 9,10-bis(4-iodostyryl)anthracene (BISA) have been synthesized and characterized via single crystal X-ray diffraction, powder X-ray diffraction, differential scanning calorimetry, photoluminescence spectroscopy, ultravioletvisible absorption spectroscopy, solid fluorescence quantum yield measurement and other techniques, for the purpose of studying the influence of halogen atoms on the structures and photophysical properties of 9,10-distyrylanthracene. The results indicate that the introduction of halogen atoms into DSA significantly influences the molecular geometries and stacking modes in the crystals. The photophysical properties in solution and in the crystalline state of the five compounds were comparatively investigated, and the relationship between the crystalline state emissions and crystal structures was further discussed. This work has demonstrated that the introduction of halogen atoms into DSA could influence the molecular packing and molecular geometries in the crystals and endow them with different photophysical properties.
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