Abstract:Phenanthrenequinone (PQ) doped poly(methyl methacrylate) (PMMA) photopolymer material is currently being actively investigated. A previously developed 1-D Nonlocal Photo-polymerization Driven Diffusion (NPDD) model is applied to further examine the behavior of the material post-exposure. The use of the nonlocal parameter when examining PQ/PMMA is discussed. The resulting predicted evolution of the first harmonic refractive index modulation is simulated both: (i) a long time post-exposure, and (ii) in the case of thermal treatment post-exposure. The convergence of the numerical simulations is examined, when both 12 and 4 spatial concentration harmonics are retained in the Fourier series expansions describing the various component material distributions. Several physical processes are studied, including the nonlocal material response and the effects of the diffusion of both the ground state and excited states PQ molecules (during and post-exposure). The effects of the use of different exposing intensities on the final grating formed are studied. The size of the higher grating harmonic concentration amplitudes in this final distribution is also discussed. Thus in this paper for the first time the effects/treatments taking place post-exposure are systematically studied. Our aim is to characterize the final stable grating. We show that both the nonlocal effect and the diffusion of the PQ excited states tend to weaken the PQ-PMMA grating but lead to higher fidelity of the recorded pattern. It is also shown that higher harmonic gratings are generated when higher exposing intensity is applied.

Study of PQ/PMMA Photopolymer Part 1: Theoretical Modeling

Theoretical and Experimental Examination of PQ-PMMA Photopolymer Material

Study of Pq/Pmma Photopolymer. Part 2: Experimental Results

PQ/PMMA Photopolymer: Modelling Post-Exposure

Investigations of the Behavior for PQ-PMMA Material Post-Exposure

Photochemical Kinetics for Holographic Grating Formation in Phenanthrenequinone Doped Poly (methyl Methacrylate) Photopolymer

Characteristics of holographic scattering and its application in determining kinetic parameters in PQ-PMMA photopolymer

Holographic Properties of PQ/PMMA Photopolymers with Different Thicknesses

Study on Holographic Characteristics in Znma Doped Pq-Pmma Photopolymer

Analysis of the Absorptive Behavior of Photopolymer Materials. Part I. Theoretical Modeling

Sensitivity-Enhancing Modified Holographic Photopolymer of PQ/PMMA

Enhancement of Photochemical Response in Bulk Poly(methyl Methacrylate) Photopolymer Dispersed Organometallic Compound

Optoelectronic Fast Response Properties of PQ/PMMA Polymer

Effect of Photo-Sensitizer and Thermo-Initiator Concentrations on Holographic Recording Performance of PQ/PMMA Photopolymer

Influence of Pre-Polymerization Process on Optical Properties of Phenanthrenequinone-Doped Polymethyl Methacrylate Photopolymer

Holographic Scattering in Phenanthrenequinone-Doped Poly(Methyl Methacrylate) Bulk Photopolymers

Radical Polymerization in Holographic Grating Formation in Pq-Pmma Photopolymer Part Ii: Consecutive Exposure and Dark Decay

Study on the mechanism of dark enhancement in phenanthrenequinone-doped poly(methyl methacrylate) photopolymer for holographic recording

Improvement of holographic thermal stability in phenanthrenequinone-doped poly(methyl methacrylate-co-methacrylic acid) photopolymer

Holographic storage stability in PQ-PMMA bulk photopolymer

Analysis of the Absorptive Behavior of Photopolymer Materials. Part II. Experimental Validation