High Performance FeSe0.5Te0.5thin Films Grown at Low Temperature by Pulsed Laser Deposition

Pusheng Yuan,Zhongtang Xu,Haitao Zhang,Dongliang Wang,Yanwei Ma,Ming Zhang,Jianqi Li
DOI: https://doi.org/10.1088/0953-2048/28/6/065009
2015-01-01
Superconductor Science and Technology
Abstract:We report on fully epitaxial FeSe0.5Te0.5 (FST) thin films of high quality grown on CaF2 (00l) substrate at a low temperature of 300 degrees C by pulsed laser deposition. The transport J(c) of thin films is up to 1.36 MA cm(-2) in self-field and 0.97 MA cm(-2) in 9 T at 4.2 K, indicating very weak field dependence. A near isotropy of J(c) (gamma = J(c)(H//ab)/J(c)(H//c)) as low as 1.09 at 9 T is achieved in the FST thin films. Moreover, there is no clear amorphous interfacial layer between the film and the substrate, probably due to low temperature and low laser repetition rate, while the thickness of the reaction layer is approximate 5 nm in many other works. The transmission electron microscopy evidence shows that some lattices with lateral size <5 nm x 20 nm seem to be disturbed. These location defects are thought to be responsible for the nearly isotropic behavior of the superconductivity.
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