THICKNESS-DEPENDENCE OF RESIDUAL STRESS IN LEAD-FREE FERROELECTRIC K0.5Na0.5NbO3 FILMS

Lingyan Wang,Wei Ren,Phoi Chin Goh,Kui Yao,Peng Shi,Xiaoqing Wu
DOI: https://doi.org/10.1142/s2010135x1250021x
2012-01-01
Journal of Advanced Dielectrics
Abstract:Lead-free ferroelectric K0.5Na0.5NbO3 (KNN) films with different thicknesses were prepared by polyvinlypyrrolidone (PVP)-modified chemical solution deposition (CSD) method. Their residual stresses were studied with two methods of X-ray diffraction (XRD) and nanoindentation fracture. It was found that the tensile stress occurs in KNN films with small thickness of 1.3 μm after all kinds of stresses were neutralized, which is mainly originated from the interaction across grain boundaries. With increasing the thickness to 2.5 μm and above it, the residual stress changed from tensile stresses to compressive stresses, and the compressive stress decreased with the thickness increased. These results could explain why a thicker KNN film can show improved electrical properties and the larger the thickness, the better the ferroelectric and piezoelectric properties.
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