Abstract:Holographic exposure (i.e., exposure of a photoresist coated substrate in an interference field of two light beams), followed by development in alkaline solution and subsequent ion-beam etching, remains to be the most important technique for fabricating diffraction gratings, especially large-area gratings, despite the advance of other techniques. In this process as an intermediate product the photoresist grating serves as a mask for ion-beam etching. The shape and critical dimensions of the photoresist mask directly determine the shape and critical dimensions of the etched end product, which in turn determine the performance parameters of the grating. In a crude and yet often effective approximation the shape of the mask can be taken as rectangular and the critical dimension is duty cycle (ratio of ridge width to period). The groove depth is not critical, as long as it is large enough, and it can be controlled easily by adjusting the photoresist layer thickness during spin coating and by detecting the critical turning point of the diffraction efficiency curve of one of the grating's dispersive orders during development when the photoresist in the trough is completely removed. Once the maximum groove depth has been reached the following development process predominantly manifests as reduction of duty cycle. While the efficiency monitoring method is effective for detecting the point of trough clearing, it is ineffective for measuring duty cycle. A one-dimensionally periodic grating is an optically anisotropic structure when the groove period and light wavelength are comparable. Diffraction efficiencies of TE and TM polarizations are different and their ratio is a monotonic function of duty cycle in the range of duty cycle of interest. We propose to use this property to estimate the duty-cycle of surface-relief holographic gratings during development. We will present our theoretical simulation results and experimental results.

Measurement of relief depth and refractive index variation of phase hologram

Measurement of Relief Depth and Refractive-Index Variation of Phase Hologram

Measurement of modulation amplitude of refractive index and relief amplitude of phase holographic recording medium with knife demodulating technique

Selection of Phase-Recovery Algorithms for Fringe Processing in Optical Measurement of Micro-Surface

Phase-Contrast Imaging Technology with Digital Holographic Microscope Based System Calibration

Study on measuring refractive index modulation of volume phase holographic gratings

Measurement of phase differences between the diffracted orders of deep relief gratings

Controlling the Wavefront Aberration of a Large-Aperture and High-Precision Holographic Diffraction Grating

Simultaneous Measurement of Refractive Index Distribution and Topography by Integrated Transmission and Reflection Digital Holographic Microscopy

General Measurement of Optical System Aberrations with a Continuously Variable Lateral Shear Ratio by a Randomly Encoded Hybrid Grating

In situ estimate of duty cycle of surface-relief holographic gratings during development by measuring TM/TE diffraction efficiency ratio

Measuring phase shift of gratings in codoped Fe, Mg lithium niobate crystals

Real-time Non-destructive Measurement of Diffraction Characteristic of Dynamic Volume Holograms Based on Phase Conjugate

Measuring for Thickness Distribution of Recording Layer of Plh

Generalized Phase-Shifting Real-Time Holography Based on Photorefractive Crystals

Simultaneous Measurement of Thickness and Refractive Index using Spectrum Multiplexing Digital Holographic Microscopy

Dynamic Phase Measurement based on Two-step Phase-shifting Interferometry with Geometric Phase Grating

Thickness measurement of thin film for holographic plate by Michelson interferometer

Measurement of Varied-line-space Grating Density by Phase-shift Moiréinterferometry

3D Measurements and Characterizations of Refractive Index Distributions of Volume Holographic Gratings Using Low‐Coherence Holotomography

Real-time Non-Destructive Testing of Dynamic Holograms in Doubly Doped LiNbO 3 Crystals Using Phase-Conjugate Technique