Abstract:Electrochemically induced sol-gel depositions have become a widespread, versatile method for fabricating hybrid and nanostructured oxides on conductive substrates. The process is based on the buildup of electrochemically generated OH- in the diffusion layer near the electrode surface. For the electrodeposition of silica thin films, these OH- ions catalyze the gelation of a kinetically stable precursor solution, thereby resulting in an electrochemically controlled process. The control of the diffusion layer has proven pivotal to depositing thin films while preventing the formation of aggregated by-products deeper in the solution. In this work, the silica sol-gel reactions and electrochemical OH- generation were critically analyzed and described to gain insight into the deposition mechanism. A general model is proposed that predicts the pH profile during both stationary and rotating disk electrode depositions under different conditions (i.e., current densities, times, and rotation rates). This model provides insights into the reactive zones where gelation occurs, and explains typical phenomena observed during deposition such as the dependence of film growth rates and aggregate formation on the deposition conditions. The insights and expressions obtained in this work are invaluable when designing future experiments using novel chemistries or setups.

Photo-assisted Electrodeposition of Sol–gel Films on P-Type Semiconductors

Electrochemically Patterning Sol-Gel Structures on Conducting and Insulating Surfaces

Photoelectrochemical Deposition of Silicon–Carbon Layer on P-Type Semiconductors and Aluminum–Copper Alloy in Ionic Liquid

Unravelling the Mechanism of Electrochemically Induced Sol-Gel Depositions: pH Profiles Near Electrode and Influence on Film Growth

Soluble polymer facilely self-grown <i>in situ</i> on conducting substrates at room temperature towards electrochromic applications

The Photoelectrochemical Characteration of Porous Titania Dioxide Thin Films Prepared by Peg-Assisted Sol-Gel Method

Contact Electrification Induced Interfacial Reactions and Direct Electrochemical Nanoimprint Lithography in N-Type Gallium Arsenate Wafer

Nitrate Ions As Cathodic Alkalization Promoters for the Electro-Assisted Deposition of Sol–gel Thin Films

One Step Sol-Gel Electrochemistry For The Fabrication Of Superhydrophobic Surfaces

Electrophoretic Deposition of Pb(Zr,Ti)O3 Powders on Silicon Wafer and Sintering Densification Approach

Electroless Plating of NiFeP Alloy on the Surface of Silicon Photoanode for Efficient Photoelectrochemical Water Oxidation.

Fabrication Of Photoelectrode Materials

Electrodeposition of Crystalline Silicon Films from Silicon Dioxide for Low-Cost Photovoltaic Applications

Photo-catalyzed surface hydrolysis of iridium(iii) ions on semiconductors: a facile method for the preparation of semiconductor/IrO x composite photoanodes toward oxygen evolution reaction.

Preparation and the Photoelectric Properties of ZnO-SiO2 Films with a Sol–Gel Method Combined with Spin-Coating

Sol-gel deposited ZnO substrate for the modulation of electrodeposited PEDOT nanostructures and enhancement of electrochromic stability

Processing and Characterization of Pb(Zr,Ti)O3 Thick Films on Platinum-Coated Silicon Substrate Derived from Sol–gel Deposition

Universal Deposition Strategy of Nanoporous Complex Oxide Thin Films for Photoelectrochemical Applications

Direct Growth of Graphene Nanowalls on Silica for High-Performance Photo-Electrochemical Anode

Preparation of Patterned Functional Films by Chemically Modified Sol-gel Method

Oxygen Switchable Photo-Hydrovoltaic Effect along the Silicon-Water Interface