Epoxy-Based Azo Polymer for Photofabricating Surface-Relief Quasi-Crystal Structures
Renbo Wei,Zeda Xu,Xiaogong Wang
DOI: https://doi.org/10.1364/ome.5.001348
2015-01-01
Optical Materials Express
Abstract:A new epoxy-based azo polymer (BP-AZ-CSMB), which contained chiral-substituted push-pull azo chromophores, was synthesized by the post-polymerization azo-coupling reaction. This newly synthesized polymer was characterized by H-1 NMR, FTIR, GPC, UV-Vis, DSC and TGA. When exposed to interference patterns of laser beam (532 nm, 100 mW cm(-2)), BP-AZ-CSMB showed ability to quickly form surface-reliefgratings. Due to this property, quasi-crystal surface relief structures were feasibly fabricated on the BP-AZ-CSMB films by using the dual-beam multiple exposure technique. The quasi-crystal structures with 6-, 8-, 10-, 12-, 36-, and 72-fold rotation symmetry were successfully photofabricated. (C) 2015 Optical Society of America