Abstract:Silicon-based optoelectronics, using the mature silicon-based microelectronic complementary metal oxide semiconductor (CMOS) manufacturing process, is a large-scale optoelectronic integration platform that has attracted much attention. Surface plasmonic devices have also received extensive attention in the past decades, and especially the silicon-based surface plasmonic nanofocusing devices have become a research hotspot. Typical nanofocusing structures include chirped surface gratings, plasmonic Fresnel zone plate, nano-slit array, tapered metal tips. However, there occur some inevitable problems in these devices, such as the fine structure being too complex to be fabricated and too large transmission loss of metal slot waveguide. In this work, an ultra-compact hybrid surface plasmon nanofocusing device is designed and fabricated by the silicon-based optoelectronic technology, and the nanofocusing performance of the device is also experimentally verified. The hybrid surface plasmon nanofocusing devices are fabricated on a silicon-on-insulator (SOI) wafer by electron beam lithography (EBL) system. The silicon wire waveguides, tapers and the thin silicon strips in the middle of nanofocusing regions are patterned in only one step EBL. The gold layer is formed by a deposition and lift-off process, and then a partially etching process is introduced to make the thickness of the middle thin silicon strips the same as that of the gold layer. With a 1.23-mu m-long tapered structure, our nanofocusing devices focus the light field of a silicon strip waveguide into a hybrid surface plasmon waveguide, making non-resonant optical field increase 20 times in the 1550 nm near-infrared band experimentally. The entire insertion loss is about 4.6 dB, and the mode area of the nanofocusing area is about (lambda/n)(2) / 6 40 which is over 300 times smaller than that of the input silicon waveguide. When the middle slot silicon waveguide width W-Si = 120 nm, the insertion loss reaches a minimum value of 2.8 dB. In our design, we adopt the design of silicon-based hybrid plasmonic waveguides. In this design, a layer of material with low refractive index is inserted between the metal layer and the silicon layer to act as a "container" of light field, which makes this silicon-based hybrid plasmonic waveguides have less loss than the traditional metal plasmonic waveguides, and can still maintain high optical field localization. Such silicon-based hybrid surface plasmon nanofocusing devices with simple structures and excellent performances are promising alternatives for future applications in optical field manipulation, optical sensing, nonlinear optical devices, and optical phase-change storage.

Tunable Ultracompact Chip-Integrated Multichannel Filter Based on Plasmon-Induced Transparencies

On-chip Plasmon-Induced Transparency Based on Plasmonic Coupled Nanocavities

Plasmonics: Ultracompact Chip‐Integrated Electromagnetically Induced Transparency in a Single Plasmonic Composite Nanocavity (advanced Optical Materials 4/2014)

Plasmon-induced Transparency in a Reconfigurable Composite Valley Photonic Crystal.

A Tunable On-Chip Integrated Plasmonic Filter and Router Based on Metal/Dielectric Nanostructures

Integration of Plasmonics into Nanoelectronic Circuits

Ultracompact Channel Add-Drop Filter Based on Single Multimode Nanobeam Photonic Crystal Cavity

On-Chip Multiple Electromagnetically Induced Transparencies in Photon–Plasmon Composite Nanocavities

Experimental research on ultracompact silicon hybrid plasmonic nanofocusing device

Dynamically Tunable by Kerr Effect Multichannel Filter Based on Plasmon Induced Transparencies at Optical Communication Range

Submicrometer Radius and Highly Confined Plasmonic Ring Resonator Filters Based on Hybrid Metal-Oxide-semiconductor Waveguide.

Designing plasmonic eigenstates for optical signal transmission in planar channel devices

All-optical Tunable On-Chip Plasmon-Induced Transparency Based on Two Surface-Plasmon-polaritons Absorption

Ultracompact Wavelength-Selective Silicon-Based Plasmonic Components

Speed-up electronic integrated circuits with plasmonic technology

Chip-Integrated All-Optical Diode Based on Nonlinear Plasmonic Nanocavities Covered with Multicomponent Nanocomposite

Plasmonic Waves to Electrical Current Conversion for Integrated Plasmonic-Electronic Circuits

Multichannel and Binary-Phase All-Optical Control with On-Chip Integrated Subwavelength Plasmonic Waveguides

Design of miniaturized wide band-pass plasmonic filters in MIM waveguides with tailored spectral filtering

Ultralow-power and Ultrafast All-Optical Tunable Plasmon-Induced Transparency in Metamaterials at Optical Communication Range.

Design and Simulation of a Compact Plasmonic Photonic Crystal Fiber Filter with Wide Band and High Extinction Ratio