Multiferroic Bifeo3 Thin Films Deposited on Srruo3 Buffer Layer by Rf Sputtering
R. Y. Zheng,X. S. Gao,Z. H. Zhou,J. Wang
DOI: https://doi.org/10.1063/1.2437163
IF: 2.877
2007-01-01
Journal of Applied Physics
Abstract:Sr Ru O 3 (SRO) acts as an effective buffer layer for growth of multiferroic BiFeO3 (BFO) thin films deposited on Pt∕TiO2∕SiO2∕Si substrates by radio frequency sputtering. Phase identification by using x-ray diffraction and texture studies by using atomic force microscopy show that the SRO buffer layer promotes crystallization and formation of the perovskite phase at lowered temperature. It significantly reduces the leakage current of multiferroic BFO films, giving rise to a much improved square ferroelectric hysteresis loop, in contrast to the poor loop for BFO on bare Pt∕TiO2∕SiO2∕Si substrate. A much enlarged remnant polarization (2Pr) of 144μC∕cm2 and a coercive field (Ec) of 386kV∕cm were obtained with the BFO thin film deposited on SRO∕Pt∕TiO2∕SiO2∕Si at 600°C. The BFO thin film with SRO buffer layer also shows a large nonvolatile polarization (ΔP=Psw−Pnsw) of 122μC∕cm2 at 20μs, which promises excellent performance for random access memories. Further interestingly, it exhibits little polarization fatigue up to 5×1010 switching cycles, at a relatively high voltage of 10V, although a notable degradation of polarization is shown at the low voltage of 6V, indicating weak domain pinning. The multiferroic thin film demonstrates a weak ferromagnetic loop with a saturation magnetization (Ms) of 1.92emu∕cm3 and coercivity (Hc) of 325Oe.
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