Abstract:The design of micro/nanostructures on silicon-on-insulator (SOI) devices has attracted widespread attention in the science and applications of integrated optics, which, however, are usually restricted by the current manufacturing technologies. Hence, in this paper, we propose a mask-free, one-step femtosecond laser lithography method for efficient fabrication of high-quality controllable planar photonic structures on SOI devices. Subwavelength gratings with high uniformity are flexibly prepared on a SOI wafer, and they can be efficiently extended for large-area fabrication with long-range uniformity. Different from the melt flow mechanism to bulk silicon, the buried SiO2 layer of the SOI material provides substantial control over the phase change process, thereby achieving local rapid vaporization to form a high-quality structure. The optical properties of the prepared structures are measured experimentally and determined to possess powerful diffraction and light-coupling characteristics. Strikingly, active control of the SOI surface structure morphology, from the grating to the periodic silicon wire structure, can be realized through precision adjustment of the pulse injection volumes. A homogeneous silicon photonic wire is successfully generated on the SOI device, providing an alternative to the preparation of waveguides. This effective femtosecond laser lithography method for fabricating controllable photonic structures on SOI devices is expected to further promote the development of integrated optics.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsami.1c11292.Comparison of the surface structure on bulk silicon and SOI upon single femtosecond pulse irradiation; influence of laser fluence on the formation of the SOI surface structure; evolution of the surface structure of bulk silicon as laser fluence increases; influence of SOI structural parameters on femtosecond laser processing; microwire width and grating period at different scanning speeds; EDX analyses of grating structure and microwire structure; and Raman spectroscopy analysis of the laser-exposed region (PDF)This article has not yet been cited by other publications.

Processing Grating Structures on Surfaces of Wide-Bandgap Semiconductors Using Femtosecond Laser and Phase Mask

Fabrication of Grating Structures on Silicon Carbide by Femtosecond Laser Irradiation and Wet Etching

Single-lobe, Surface-Normal Beam Surface Emission from Second-Order Distributed Feedback Lasers with Half-Wave Grating Phase Shift

Controllable Photonic Structures on Silicon-on-Insulator Devices Fabricated Using Femtosecond Laser Lithography

Cylindrically Focused Nonablative Femtosecond Laser Processing of Long‐Range Uniform Periodic Surface Structures with Tunable Diffraction Efficiency

High Temperature SiC Gratings Inscribed with Femtosecond Laser

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Femtosecond Laser Nanostructuring on a 4H-Sic Surface by Tailoring the Induced Self-Assembled Nanogratings

Analysis of High-Order Surface Gratings Based on Micron Lasers on Silicon

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Surface Bragg gratings for high brightness lasers

A review of ultra-short pulse laser micromachining of wide bandgap semiconductor materials: SiC and GaN

Submicron Embedded Air/GaN Diffraction Gratings for Photonic Applications

Processing Microgrooves and Craters on the Surface of Wide Band Gap Mold Material Using Femtosecond Laser

InGaAs/GaAs nano-ridge laser with an amorphous silicon grating monolithically grown on a 300 mm Si wafer

Fabrication of Sub-Micrometer Periodic Nanostructures Using Pulsed Laser Interference for Efficient Light Trapping in Optoelectronic Devices

High-Efficiency Fabrication of Geometric Phase Elements by Femtosecond-Laser Direct Writing

Femtosecond laser two-beam interference applied to 4H-SiC surface hierarchical micro-nano structure fabrication

Deepening of nanograting structures on Si by a two-step laser spatial-selective amorphization strategy combined with chemical etching

Nanoscale morphology and thermal properties of low insertion loss fiber Bragg gratings produced using the phase mask technique and a single femtosecond laser pulse

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface