Effect of substrate symmetry on the orientations of MoS 2 monolayers
Shuangyuan Pan,Pengfei Yang,Lijie Zhu,Min Hong,Chunyu Xie,Fan Zhou,Yuping Shi,Yahuan Huan,Fangfang Cui,Yanfeng Zhang
DOI: https://doi.org/10.1088/1361-6528/abc566
IF: 3.5
2020-12-03
Nanotechnology
Abstract:Abstract Two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDs) are promising platforms for developing next-generation electronic and optoelectronic devices due to their unique properties. To achieve this, the growth of large single-crystal TMDs is a critical issue. Unraveling the factors affecting the nucleation and domain orientation should hold fundamental significance. Herein, we design the chemical vapor deposition growth of monolayer MoS 2 triangles on Au(111) and Au(100) facets, for exploring the substrate facet effects on the domain orientations. According to multi-scale characterizations, we find that, the obtained triangular MoS 2 domains present two preferential orientations on the six-fold symmetric Au(111) facet, whereas four predominant orientations on the four-fold symmetric Au(100) facet. Using on-site scanning tunneling microscopy, we further reveal the preferred alignments of monolayer MoS 2 triangles along the close-packed directions of both Au(111) and Au(100) facets. Moreover, bunched substrate steps are also found to form along the close-packed directions of the crystal facets, which guides the preferential nucleation of monolayer MoS 2 along the step edges. This work should hereby deepen the understanding of the substrate facet/step effect on the nucleation and orientation of monolayer MoS 2 domains, thus providing fundamental insights into the controllable syntheses of large single-crystal TMD monolayers.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology