Production and processing of graphene and related materials
Claudia Backes,Amr M Abdelkader,Concepcin Alonso,Amandine Andrieux-Ledier,Raul Arenal,Jon Azpeitia,Nilanthy Balakrishnan,Luca Banszerus,Julien Barjon,Ruben Bartali,Sebastiano Bellani,Claire Berger,Reinhard Berger,M M Bernal Ortega,Carlo Bernard,Peter H Beton,Andr Beyer,Alberto Bianco,Peter Bggild,Francesco Bonaccorso,Gabriela Borin Barin,Cristina Botas,Rebeca A Bueno,Daniel Carriazo,Andres Castellanos-Gomez,Meganne Christian,Artur Ciesielski,Tymoteusz Ciuk,Matthew T Cole,Jonathan Coleman,Camilla Coletti,Luigi Crema,Huanyao Cun,Daniela Dasler,Domenico De Fazio,Noel Dez,Simon Drieschner,Georg S Duesberg,Roman Fasel,Xinliang Feng,Alberto Fina,Stiven Forti,Costas Galiotis,Giovanni Garberoglio,Jorge M Garca,Jose Antonio Garrido,Marco Gibertini,Armin Glzhuser,Julio Gmez,Thomas Greber,Frank Hauke,Adrian Hemmi,Irene Hernandez-Rodriguez,Andreas Hirsch,Stephen A Hodge,Yves Huttel,Peter U Jepsen,Ignacio Jimenez,Ute Kaiser,Tommi Kaplas,HoKwon Kim,Andras Kis,Konstantinos Papagelis,Kostas Kostarelos,Aleksandra Krajewska,Kangho Lee,Changfeng Li,Harri Lipsanen,Andrea Liscio,Martin R Lohe,Annick Loiseau,Lucia Lombardi,Maria Francisca Lpez,Oliver Martin,Cristina Martn,Lidia Martnez,Jose Angel Martin-Gago,Jos Ignacio Martnez,Nicola Marzari,lvaro Mayoral,John McManus,Manuela Melucci,Javier Mndez,Cesar Merino,Pablo Merino,Andreas P Meyer,Elisa Miniussi,Vaidotas Miseikis,Neeraj Mishra,Vittorio Morandi,Carmen Munuera,Roberto Muoz,Hugo Nolan,Luca Ortolani,Anna K Ott,Irene Palacio,Vincenzo Palermo,John Parthenios,Iwona Pasternak,Amalia Patane,Maurizio Prato,Henri Prevost,Vladimir Prudkovskiy,Nicola Pugno,Tefilo Rojo,Antonio Rossi,Pascal Ruffieux,Paolo Samor,Lonard Schu,Eki Setijadi,Thomas Seyller,Giorgio Speranza,Christoph Stampfer,Ingrid Stenger,Wlodek Strupinski,Yuri Svirko,Simone Taioli,Kenneth B K Teo,Matteo Testi,Flavia Tomarchio,Mauro Tortello,Emanuele Treossi,Andrey Turchanin,Ester Vazquez,Elvira Villaro,Patrick R Whelan,Zhenyuan Xia,Rositza Yakimova,Sheng Yang,G Reza Yazdi,Chanyoung Yim,Duhee Yoon,Xianghui Zhang,Xiaodong Zhuang,Luigi Colombo,Andrea C Ferrari,Mar Garcia-Hernandez,Concepción Alonso,André Beyer,Peter Bøggild,Noel Díez,Jorge M García,Armin Gölzhäuser,Julio Gómez,Maria Francisca López,Cristina Martín,Lidia Martínez,José Ignacio Martínez,Álvaro Mayoral,Javier Méndez,Roberto Muñoz,Teófilo Rojo,Paolo Samorì,Léonard Schué
DOI: https://doi.org/10.1088/2053-1583/ab1e0a
IF: 6.861
2020-01-29
2D Materials
Abstract:We present an overview of the main techniques for production and processing of graphene and related materials (GRMs), as well as the key characterization procedures. We adopt a 'hands-on' approach, providing practical details and procedures as derived from literature as well as from the authors' experience, in order to enable the reader to reproduce the results.Section I is devoted to 'bottom up' approaches, whereby individual constituents are pieced together into more complex structures. We consider graphene nanoribbons (GNRs) produced either by solution processing or by on-surface synthesis in ultra high vacuum (UHV), as well carbon nanomembranes (CNM). Production of a variety of GNRs with tailored band gaps and edge shapes is now possible. CNMs can be tuned in terms of porosity, crystallinity and electronic behaviour.Section II covers 'top down' techniques. These rely on breaking down of a layered precursor, in the graphene case usually natural crystals like graphite or artificially synthesized materials, such as highly oriented pyrolythic graphite, monolayers or few layers (FL) flakes. The main focus of this section is on various exfoliation techniques in a liquid media, either intercalation or liquid phase exfoliation (LPE). The choice of precursor, exfoliation method, medium as well as the control of parameters such as time or temperature are crucial. A definite choice of parameters and conditions yields a particular material with specific properties that makes it more suitable for a targeted application. We cover protocols for the graphitic precursors to graphene oxide (GO). This is an important material for a range of applications in biomedicine, energy storage, nanocomposites, etc. Hummers' and modified Hummers' methods are used to make GO that subsequently can be reduced to obtain reduced graphene oxide (RGO) with a variety of strategies. GO flakes are also employed to prepare three-dimensional (3d) low density structures, such as sponges, foams, hydro- or aerogels. The assembly of flakes into 3d structures can provide improved mechanical properties. Aerogels with a highly open structure, with interconnected hierarchical pores, can enhance the accessibility to the whole surface area, as relevant for a number of applications, such as energy storage. The main recipes to yield graphite intercalation compounds (GICs) are also discussed. GICs are suitable precursors for covalent functionalization of graphene, but can also be used for the synthesis of uncharged graphene in solution. Degradation of the molecules intercalated in GICs can be triggered by high temperature treatment or microwave irradiation, creating a gas pressure surge in graphite and exfoliation. Electrochemical exfoliation by applying a voltage in an electrolyte to a graphite electrode can be tuned by varying precursors, electrolytes and potential. Graphite electrodes can be either negatively or positively intercalated to obtain GICs that are subsequently exfoliated. We also discuss the materials that can be amenable to exfoliation, by employing a theoretical data-mining approach.The exfoliation of LMs usually results in a heterogeneous dispersion of flakes with different lateral size and thickness. This is a critical bottleneck for applications, and hinders the full exploitation of GRMs produced by solution processing. The establishment of procedures to control the morphological properties of exfoliated GRMs, which also need to be industrially scalable, is one of the key needs. Section III deals with the processing of flakes. (Ultra)centrifugation techniques have thus far been the most investigated to sort GRMs following ultrasonication, shear mixing, ball milling, microfluidization, and wet-jet milling. It allows sorting by size and thickness. Inks formulated from GRM dispersions can be printed using a number of processes, from inkjet to screen printing. Each technique has specific rheological requirements, as well as geometrical constraints. The solvent choice is critical, not only for the GRM stability, but also in terms of optimizing printing on different substrates, such as glass, Si, plastic, paper, etc, all with different surface energies. Chemical modifications of such substrates is also a key step.Sections IV–VII are devoted to the growth of GRMs on various substrates and their processing after growth to place them on the surface of choice for specific applications. The substrate for graphene growth is a key determinant of the nature and quality of the resultant film. The lattice mismatch between graphene and substrate influences the resulting crystallinity. Growth on insulators, such as SiO<sub>2,</sub> typically results in films with small crystallites, whereas growth on the close-packed surfaces of metals yields highly crystalline films. Section IV outlines the growth of graphene on SiC substrates. This satisfies the requirements for electronic applications, with well-def <p>-Abstract Truncated-</p>
materials science, multidisciplinary