Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Deformation grating fabrication technique based on the solvent-assisted microcontact molding.

High-Frequency Deformation Grating Fabrication Techniques and Applications

High-Uniformity Submicron Gratings with Tunable Periods Fabricated through Femtosecond Laser-Assisted Molding Technology for Deformation Detection

A New Grating Fabrication Technique on Metal Films Using UV-Nanoimprint Lithography

New Methods of Fabricating Gratings for Deformation Measurements: A Review

A Novel Method to Fabricate Micro-Gratings Applied for Deformation Measurement Around A Crack in A Thin Film

Fabrication of Micro-Moiré Gratings on a Strain Sensor Structure for Deformation Analysis with Micro-Moiré Technique

Stretching-tunable Metal Gratings Fabricated on an Elastomeric Substrate Using a Water-Soluble Sacrificial Layer

Fabrication of High-Density Moiré Gratings

Nano-Grating Fabrication Technique

A New Moiré Grating Fabrication Technique Using Hot Embossing Lithography

Micro/Nano Grating and Its Application to Moire Measurement

The Technique for Fabricating Submicron Moiré Grating Using FIB Milling

Study of Moiré Grating Fabrication on Metal Samples Using Nanoimprint Lithography

Fabrication Technique of Nano-Grating Using Afm

The fabrication of high-performance diffraction gratings via vibration-assisted UV nanoimprinting lithography

Mechanics of Dielectric Elastomer-Activated Deformable Transmission Grating

Pre-stress-assisted Nanoimprint Lithography for Fabricating High-Density Diffraction Gratings

Versatile Specimen-Grating Fabrication Technique For Moire Method Based On Solute-Solvent Separation Soft Lithography

Fabrication of high-frequency moiré gratings for microscopic deformation measurement using focused ion beam milling

Investigation on Fabrication Process and Structural Fidelity of the Flash Grating