Controlled Evaporative Self-Assembly Of Poly(Acrylic Acid) In A Confined Geometry For Fabricating Patterned Polymer Brushes

Yonghong Men,Peng Xiao,Jing Chen,Jun Fu,Youju Huang,Jiawei Zhang,Zhengchao Xie,Wenqin Wang,Tao Chen
DOI: https://doi.org/10.1021/la500996a
IF: 3.9
2014-01-01
Langmuir
Abstract:A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.
What problem does this paper attempt to address?