Abstract:The crystalline structures and surface morphologies of the SiO2 and Nb2O5 single-layer films were measured using XRD pattern and FESEM and their optical properties (the refractive indices and extinction coefficients) were measured as a function of optical wavelength. After the refractive indices of the SiO2 and Nb2O5 single-layer films were measured, the thicknesses of the SiO2 and Nb2O5 bi-layer films with 1/4 wavelength (λ) for the blue-light (450 nm) distributed Bragg reflectors were obtained. The SiO2–Nb2O5 bi-layer films (called as one period) with two, four, and six periods on glass substrates was deposited using an E-beam system to fabricate the distributed Bragg reflectors (DBRs). The thickness of each layer of SiO2 and Nb2O5 films in the multilayer structure was measured using FESEM equipped with FIB and TEM. The important novelty is that we constructed an overall transfer matrix and calculated the simulated reflectance spectra by incorporating the variable refractive index and thickness of each layer of SiO2 and Nb2O5 films. Another novelty is that we compared the measured maximum reflectance ratios of the fabricated DBRs with the simulation results obtained from the investigated overall transfer matrix method and Sheppard's approximate equation (maximum reflectance ratio at a specific wavelength).

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