Nanofiber Forests with High Infrared Absorptance

H. Y. Mao,C. Lei,Y. J. Chen,Z. J. Chen,W. Ou,W. G. Wu,A. J. Ming,D. P. Chen
DOI: https://doi.org/10.1109/memsys.2014.6765723
2014-01-01
Abstract:In this work, nanofiber forests with high infrared (IR) absorptance are reported. In wavelength range from 1.5 to 5 μm, the absorptance of the nanofiber forests reaches a minimum of 96%, which is much higher than that of Si3N4-based IR absorbers and the polymer coatings from which the nanofibers are obtained. Such nanofiber forests are fabricated by using a plasma-stripping-of-polymer technique, which is fast, high-yield and applicable to a wide range of polymers. Moreover, the technique is highly compatible with micro-fabrication. As a result, the nanofiber forests can be introduced into MEMS (Micro-Electro-Mechanical systems) IR devices, and it is expected that the performance of such devices can be improved.
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