Spontaneous exfoliation and tailoring of MoS2 in mixed solvents.

Lei Dong,Shan Lin,Liu Yang,Jiajia Zhang,Chao Yang,Dong Yang,Hongbin Lu
DOI: https://doi.org/10.1039/c4cc07238c
IF: 4.9
2014-01-01
Chemical Communications
Abstract:Spontaneous exfoliation of MoS2 is achieved in H2O2-NMP mixed solvents with a yield of over 60 wt%, operated under mild conditions. H2O2-prompted sheet-tailoring effect induces a size evolution of MoS2 nanosheets from micro-scale to nano-scale. Furthermore, the concurrent dissolution also affords an approach to introduce structural defects in the nanosheets.
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