Broadband Antireflection and Absorption Enhancement by Forming Nano-Patterned Si Structures for Solar Cells

Y. Liu,S. H. Sun,J. Xu,L. Zhao,H. C. Sun,J. Li,W. W. Mu,L. Xu,K. J. Chen
DOI: https://doi.org/10.1364/oe.19.0a1051
IF: 3.8
2011-01-01
Optics Express
Abstract:In this letter, we report the antireflection and light absorption enhancement by forming sub-wavelength nano-patterned Si structures via nano-sphere lithography technique. It is found that the surface reflection can be significantly suppressed in a wide spectral range (400-1000 nm) and the weighted mean reflection is less than 5%. Meanwhile, the broad band optical absorption enhancement is achieved consequently. Heterojunction solar cells are prepared by depositing ultrathin amorphous Si film on the nano-patterned Si structures, the short circuit current density increases to 37.2 mA/cm(2)and the power conversion efficiency is obviously improved compared to the reference cell on flat Si substrate.
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