Oxygen Partial Pressure Effect on the Thermal Stability of Nd-123 Superconductor Thin Films

S. B. Yan,Y. Y. Chen,L. Cheng,X. Yao
DOI: https://doi.org/10.1063/1.3618675
IF: 2.877
2011-01-01
Journal of Applied Physics
Abstract:The effect of oxygen partial pressure on the thermal stability of Nd-123 superconductor thin films was investigated by means of high temperature in situ microscopy. It was found that the thermal stability of Nd-123 films decreases as the oxygen partial pressure increases. We attribute the thermal stability suppression to the increased growth rate of Nd-422 and a high concentration difference ratio. Under the assumption of quasi-equilibrium, a simplified model for peritectic melting of RE-123 was suggested.
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