Fabrication and Magnetic Properties of Small Fept Dot Arrays

Z. J. Yan,S. Takahashi,Y. Kondo,J. Ariake,T. Sakon,D. S. Xue,S. Ishio

DOI: https://doi.org/10.1088/0022-3727/44/18/185002

2011-01-01

Abstract:FePt dot arrays with dot sizes ranging from 100 down to 15 nm were fabricated using sputtering, annealing and patterning techniques. The dot diameter distribution and dot position deviation are greater for smaller dot arrays than for larger dot arrays. The dot arrays produced through a sequence of annealing followed by patterning have a large perpendicular magnetic anisotropy resulting from the highly L1(0)-ordered structure and the perpendicular orientation of the [0 0 1] crystalline axis, whereas samples of annealing after patterning display a magnetic vortex structure. As the dot size reduces from 100 to 29.9 nm, the arrays produced by annealing and then patterning exhibit an increase in the remanent coercivity H-cr from 15.7 to 21 kOe because fewer defects are contained by the smaller dots. This result is explained by nucleation and domain wall propagation mechanisms. For 15.4 nm dot arrays, a model of dot with damaged edge may interpret the decreasing coercivity behaviour.