Reducing Surface Defects of CrXOY Film in Mid-Frequency Dual-Magnetron Sputtering

Yu Xiang,Ma Lei,Liu Yang,Yang Zhongzhou,Hua Meng

DOI: https://doi.org/10.4028/www.scientific.net/amr.291-294.219

2011-01-01

Advanced Materials Research

Abstract:Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of CrxOy film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of -120~-240 V, an optimized CrxOy film has been synthesized with surface defect density low to 78 defect/mm-2.