Characterization and Electrochemical Properties of Gold-Ion Implanted Boron-Doped Diamond

Jiao,Jiadao Wang,Qunxia Chen,Jingbo Hu
DOI: https://doi.org/10.1149/2.092112jes
IF: 3.9
2011-01-01
Journal of The Electrochemical Society
Abstract:The novel gold ion-implanted boron-doped diamond (BDD) films as reported in this paper were prepared by applying ion implantation technique and characterized by atomic force microscopy, scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, electrochemical impedance spectroscopy and cyclic voltammetry. The implanted gold nanoparticles were well-distributed with the size of approximately 50 nm and existed in the form of metallic gold. The chemical state of the surface and the structure of the BDD films changed after gold ion implantation. The electrochemical properties of gold ion-implanted BDD were studied by comparing them with those of as-grown BDD while using [Fe(CN)(6)](3-/4-) as an electrochemical probe. The results show that the gold ion-implanted BDD not only accelerated the electron transfer and offered high specific surface area, but also provided electrocatalytic activity and selectivity towards the oxidation of dopamine. (C) 2011 The Electrochemical Society. [DOI: 10.1149/2.092112jes] All rights reserved.
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