Flow Behavior of Resist in Room-Temperature Micro-Imprinting and Its Process Optimization

魏正英,熊孝东,杜军,丁玉成

DOI: https://doi.org/10.3788/ope.20101808.1822

2010-01-01

Optics and Precision Engineering

Abstract:To improve the replicating precision of resist in micro-imprinting,the POLYFLOW was used to simulate its flow behavior in room-temperature micro-imprinting based on the Fluid-Solid-Interaction(FSI)method.The effects of the initial thickness and residual thickness of the resist,the ratio of height to width and duty ratio of the mold,and the imprinting velocity of the mold on the resist flow behavior in a cavity were analyzed systematically.A platform of visual experiments was established,and the process of micro-imprinting and the profile of resist in different technological conditions were observed.Comparing the experimental results to the simulation results,it is concluded that the filling rate can come up to 90% when the imprinting velocity is slower than 1 μm/s,the duty ratio is more than 0.375,and the ratio of height to width is less than 2.Obtained results show that the imprinting process condition and the structure of the mold have been optimized and the replicating precision can be improved by the optimized results.