A fast integrated a-Si gate driver

Liao Congwei,Wang Longyan,He Changde,Liang Yinan,Zhang Shengdong,Dai David,Chung Smart,Teansen Jen
DOI: https://doi.org/10.1109/ICSICT.2010.5667579
2010-01-01
Abstract:A fast integrated gate driver with amorphous silicon thin film transistor (a-Si:H TFT) is proposed in this paper. To improve the circuit speed, a new input scheme is designed to provide a full scale pre-charge voltage. So the loss of pre-charge voltage, a challenge in the conventional designs, is avoided. Simulations show that the proposed gate driver has a much improved driving speed in comparison with the conventional ones. The improvement is more effective in the case of the higher VTH and lower supply voltage. The proposed gate driver is suitable for high performance display applications.
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