Influence of Supercritical Gas Anti-solvent Technological Conditions on Particle Size and Modes of Crystallization of CL-20

陈亚芳,王保国,张景林,高敏
DOI: https://doi.org/10.3969/j.issn.1007-7812.2010.03.003
2010-01-01
Abstract:The sub-micron e-CL-20 with average particle size of 721.9nm was prepared by gas anti-solvent(GAS) technique.Some of the technical conditions affecting the particle size and modes of crystallization of CL-20 were studied.Small scale gap test and impact sensitivity of sub-micron CL-20 and its raw material were tested.Optimized parameters of preparing the sub-micron e-CL-20 are obtained: average pressure increase velocity 4.0MPa/min,solution concentration 8.0g/100mL,system temperature 50℃ and system pressure 10.5MPa.It can be found that its gap thickness is decreased 58.6% and its characteristic droop height is higher 84.1% than that of its raw materials.
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