Crystalline Core/Shell Si/Sio2 Nanotubes Formed Via Interfacial Stress Imbalance

L. Z. Liu,X. L. Wu,Z. Y. Zhang,L. L. Xu,T. H. Li,Paul K. Chu
DOI: https://doi.org/10.1166/jnn.2010.2443
2010-01-01
Journal of Nanoscience and Nanotechnology
Abstract:Crystalline core/shell Si/SiO2 nanotubes (NTs) with outer diameters of 130-220 nm and lengths of similar to 1 mu m have been synthesized using thermal evaporation. High resolution scanning electron microscopy reveals that the NT formation stems from the intrinsic interfacial stress imbalance in the strained Si/SiO2 bilayered film, consequently leading to NTs with different orifice levels. The NT diameters depend strongly on the bilayer film thicknesses and crystal orientations of the Si and SiO2 layers. A modified Timoshenko formula is derived to calculate the dependence of the tube diameter on the bilayer film thickness. The obtained results are consistent well with experimental data.
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