Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO_2 Thin Film by Nano Imprint Lithography

连芩,刘红忠,丁玉成,尹磊
DOI: https://doi.org/10.3321/j.issn:0253-987x.2009.11.019
2009-01-01
Abstract:A UV-based nano imprint lithography (NIL) method is developed to fabricate thin film with controlled TiO2 nanocrystal island array on the transparent conductive glass substrate for dye sensitive solar cells (DSSC). The UV curable TiO2 sol is prepared to form TiO2 thin film with 3 μm critical dimension TiO2 nanocrystal island array by mixing TiO2 powder,dispersant,emulsifier,alcohol and UV-curable resin. Ultimately,TiO2 thin film with orderly island array is fabricated by the pressure holding replica optimized technique. The thin film is further heated up to 600 ℃ to wipe off the adulterant like UV-curable resist and cooled down to 450 ℃,then the TiO2 nanocrystal island on the thin film is changed to the anatase TiO2. The experimental results show that DSSC equipped with TiO2 nanocrystal island array is endowed with conversion efficiency over 2.7% under AM 1.5 illumination (0.1 W/cm2),which infers that the NIL method can be employed to fabricate highly stable DSSC with quasi-solid-state or solid state electrolyte.
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