The Theoretical Analysis of Tri-Beam SPPs Interference Through Ag Film

Fengze Jin,Jinglei Du,Yongkang Guo,Lifang Shi,Chunlei Du
DOI: https://doi.org/10.1117/12.832081
2009-01-01
Abstract:Through combination of multi-beam coherent SPPs which are excited by p-polarized wide light which illuminates the interface between prism and metal with resonance angle for interference exposure with, and optimizes exposal parameter of interference lithography, we can obtain high differentiate and high contrast of periodicity nanometer structure by using SPPs of shortwave and near field with enhanced. In this paper,we set up interferential model of SPPs using equation groups of Maxwell below Kretschmann structure, and simulate SPPs interferns and receive nanometer lattice and discuss the influence of refractive index of prism and resist .The method is suitable for fabricating nanometer photonic crystal and deep sub-micrometer periodic patterns in large field size used in opto-eletronical components and it can effectively debase got-up cost.
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