Nanocubic Boron Nitride/Nanodiamond Multilayer Structures

Heqin Li,KarMan Leung,KwokLeung Ma,Qing Y,YatMing Chong,Yousheng Zou,Wenjun Zhang,Shuittong Lee,Igor Bello
DOI: https://doi.org/10.1063/1.2809382
IF: 4
2007-01-01
Applied Physics Letters
Abstract:Nanocubic boron nitride/nanodiamond (N-cBN/ND) multilayer structures with each alternating layer being similar to 100 nm thick have been prepared by magnetron sputter and microwave plasma enhanced chemical vapor depositions. These multilayers exhibit remarkable properties, in particular, the mechanical properties. The multilayer structure is characteristic with (i) extreme hardness (82 GPa) considerably surpassing the values of the individual materials from which the multilayer is composed, (ii) high surface smoothness, (iii) significantly reduced film stress when compared with a single cBN layer of equivalent thickness, and (iv) great chemical stability. The N-cBN/ND multilayers developed have therefore important implications in mechanical and chemically resistant applications. (c) 2007 American Institute of Physics.
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