Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials

Lei HUANG,Yue-jing BIN,Xin HUANG,Fu-shi ZHANG
DOI: https://doi.org/10.3969/j.issn.1674-0475.2007.02.009
2007-01-01
Abstract:A new phthalocyanine derivative, the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine. The photolysis properties of the compound exposed with UV light was investigated. It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure. With good photocatalysis property, this photoacid-generator is applicable to chemically amplified photoresist.
What problem does this paper attempt to address?