Effect of Annealing Temperature on Binary Tio2 : Sio2 Nanocrystalline Thin Films

F. Mei,C. Liu,L. Zhou,W. K. Zhao,Y. L. Fang,J. B. Wang,Y. Y. Ren
2006-01-01
Journal of the Korean Physical Society
Abstract:Binary TiO2:SiO2 nanocrystalline thin films were prepared using liquid phase deposition at 35 degrees C and annealed in air at temperatures ranging from 100 degrees C to 500 degrees C. The microstructural and the optical properties of the thin films were characterized by using an ultraviolet-visible spectrophotometer, a Fourier transform infrared spectrophotometer, a scanning electron microscope, and a transmission electron microscope. The photocatalytic performance of the thin films was evaluated by using photocatalytic degradation of methylene blue. The results showed that most TiO2 nanocrystallites were uniformly dispersed onto an amorphous SiO2 matrix and that nanopores had been formed on top of the TiO2 nanoparticles, resulting in an improved photocatalytic efficiency due to an increase number of effective adsorption sites. As we increased the annealing temperature, the small crystallites progressively aggregated into larger clusters, reducing the specific surface area of the TiO2 nanocrystallites. Moreover, SiO2 nanopowders moved towards the surface and covered the TiO2, resulting in a decreased photocatalytic activity.
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