Explicitly correlated ab initio potential energy surface and predicted rovibrational spectra for H 2 O–N 2 and D 2 O–N 2 complexes
Lu Wang,Xiao-Long Zhang,Yu Zhai,Marcel Nooijen,Hui Li
DOI: https://doi.org/10.1063/5.0009098
IF: 4.304
2020-08-07
The Journal of Chemical Physics
Abstract:An <i>ab initio</i> intermolecular potential energy surface (PES) for the van der Waals complex of H<sub>2</sub>O–N<sub>2</sub> that explicitly incorporates the intramolecular <i>Q</i><sub>2</sub> bending normal mode of the H<sub>2</sub>O monomer is presented. The electronic structure computations have been carried out at the explicitly correlated coupled cluster theory [CCSD(T)-F12] with an augmented correlation-consistent triple zeta basis set and an additional bond function. Analytic five-dimensional intermolecular PESs for <i>ν</i><sub>2</sub>(H<sub>2</sub>O) = 0 and 1 are obtained by fitting to the multi-dimensional Morse/long-range potential function form. These fits to 40 890 points have the root-mean-square (rms) discrepancy of 0.88 cm<sup>−1</sup> for interaction energies less than 2000.0 cm<sup>−1</sup>. The resulting vibrationally averaged PESs provide good representations of the experimental microwave and infrared data: for microwave transitions of H<sub>2</sub>O–N<sub>2</sub>, the rms discrepancy is only 0.0003 cm<sup>−1</sup>, and for infrared transitions of the <i>A</i><sub>1</sub> symmetry of the H<sub>2</sub>O(<i>ν</i><sub>2</sub> = 1 ← 0)–N<sub>2</sub>, the rms discrepancy is 0.001 cm<sup>−1</sup>. The calculated infrared band origin shifts associated with the <i>ν</i><sub>2</sub> bending vibration of water are 2.210 cm<sup>−1</sup> and 1.323 cm<sup>−1</sup> for H<sub>2</sub>O–N<sub>2</sub> and D<sub>2</sub>O–N<sub>2</sub>, respectively, in good agreement with the experimental values of 2.254 cm<sup>−1</sup> and 1.266 cm<sup>−1</sup>. The benchmark tests and comparisons of the predicted spectral properties are carried out between CCSD(T)-F12a and CCSD(T)-F12b approaches.
chemistry, physical,physics, atomic, molecular & chemical