Realization Of An Integrated Planar Lc Low-Pass Filter With Modified Surface Micromachining Technology

jiunn fang,z w liu,z m chen,l t liu,z j li
DOI: https://doi.org/10.1109/EDSSC.2005.1635379
2005-01-01
Abstract:An Integrated Planar LC LPF(Low-Pass Filter) is designed and fabricated with Modified Surface Micromachining. The LPF is accomplished on low-resistance silicon substrate. To increase the performance of the filter, the substrate underneath the devices is modified with OPS (oxided porous silicon) technology. Measurement results give -3dB bandwidth of 2.925GHz and midband insertion loss of 0.874dB at 500MHz.
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