286-TW Ti:sapphire Laser at CAEP

HS Peng,XJ Huang,QH Zhu,XD Wang,KN Zhou,XF Wei,LQ Liu,XM Zeng,X Wang,Y Guo,DH Lin,XD Yuan,B Xu,LB Xu,XL Chu,XM Zhang,LJ Qian
DOI: https://doi.org/10.1117/12.572096
2005-01-01
Abstract:We have built a three-stage Ti:sapphire laser system at CAEP which could deliver 5-TW, 30-TW and 286-TW pulses to the corresponding target chambers for diverse applications with innovative high-power Ti:sapphire crystal amplifiers. Pulse durations of 30fs have been obtained by installing an acousto-optic programmable dispersive filter (AOPDF) before the stretcher to compensate for the spectral gain narrowing. By taking a number of advanced measures for spatial beam control, near-diffraction limited focal spots (FWHM) have been obtained which, to our knowledge, are the best far fields ever measured for the existing high-power Ti:sapphire laser systems without deformable mirror correction. Focused laser intensity is about 10(21)W/cm(2) measured with an f/1.7 OAP. The laser system has the potential to operate at 500TW and even higher and laser intensities of 10(22)W/cm(2) are expected with deformable mirror for wavefront correction and small f-number fine OAP for tighter focus added to the system in the near future.
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