Abstract:The evolution of surface morphology of Cu-W thin films with deposition time on silicon wafers was studied by discrete wavelet transform (DWT). A strategy based on wavelet transform to describe surface morphology of thin films was presented. The results showed that the surface morphology of thin films was unstable until the sputtering time exceeds 10 min. The surface morphology variations of different thin films could be distinguished primarily by high frequency signals.

Morphological characterization of Cu-W thin films based on wavelet transform