High Duty, Long Lifetime, Cathodic Arc Plasma Source

LP Wang,XF Wang,BY Tang,KY Gan,XY Peng

DOI: https://doi.org/10.1063/1.1573746

2003-01-01

Abstract:We have developed a repetitively pulsed cathodic arc plasma source that can operate at high duty cycle and with long lifetime between downtimes for cathode maintenance. The arc discharge current can be up to 300 A, the arc pulse width can be varied from 0.1 to 4 ms, and the source can operate at a duty cycle of up to 30% for many hours. The cathode can be of a diameter from 20 to 40 mm, and can be easily and quickly changed. A 45° magnetic duct is used for macroparticle filtering, employing a pulsed magnetic field. We have operated the source over a wide parameter range, and we report here on the variation of plasma ion deposition current with arc current, duct magnetic field, and duct bias voltage. A momentary ion deposition current of 0.7 A was obtained with the source running stably for more than 8 h with an arc current of 100 A and duty cycle of 20%.