Influences on Inscription Rates of Surface Relief Gratings - Ii. Methyl Substituent Effect of Azo Chromophores

YN He,XG Wang,QX Zhou
DOI: https://doi.org/10.3321/j.issn:1000-3304.2003.04.018
2003-01-01
Acta Polymerica Sinica
Abstract:A series of polymers containing azo chromophores with different number of methyl substituents have been designed and synthesized. Three epoxy-based precursor polymers were prepared by reactions of diglycidyl ether of bisphenol-A with aniline, 3-methylaniline, and 3,5-dimethylaniline respectively. The precursor polymers were reacted with diazonium salt at the final stage of the synthetic routes to introduce donor-acceptor type azo chromophores. The polymers synthesized were characterized by using various spectroscopic methods and thermal analysis. Photoprocessibility of photoinduced surface-relief-gratings on the polymer films was studied carefully. With the same irradiating light intensity and approximately equal film thickness, the rates of SRG formation significantly depend on the number of methyl substituents on the azo chromophores. For polymers with the same type of electron withdrawing group, the inscription rates decrease with the increase of the number of methyl substituents on the azo chromophores.
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