Computer simulation of ultra-thin crystal film growth

Peilin Wang,Tian H. Ding,Xun Cai
DOI: https://doi.org/10.3321/j.issn:1000-3290.2002.09.036
2002-01-01
Abstract:A new model is proposed to simulate the whole process of ultra-thin crystal film growth. The concepts of reseau and seize section are introduced to treat the complex relationship among atoms. The effects of diffusion, substrate temperature, etc., on the growth of the Ge/Si ultra-thin crystal film are studied.
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