Temperature-dependent ethylene dissociative adsorption on ruthenium
Yueyue Jiao,Huan Ma,Hui Wang,Yong−Wang Li,Xiao−Dong Wen,Haijun Jiao
DOI: https://doi.org/10.1016/j.apsusc.2023.157922
IF: 6.7
2023-07-07
Applied Surface Science
Abstract:The dissociative adsorption of ethylene onto Ru(1 1 1) at different temperatures was computed systematically at the first time. At 105 K, ethylene dissociative adsorption has the co-adsorbed CH 2 C*+2H* and CH 3 C*+H* as the first and second stable surface intermediates. At over 330 K, CH 3 C*+H* is converted back into CH 2 C* accompanied by H 2 desorption and the subsequent dissociation of CH 2 C* into HCC*, HC*+C* and 2C*. The computed Arrhenius activation barriers of the dissociation of CH 2 CH 2 (0.18 vs. 0.22 ± 0.04 eV) and CH 3 C (0.54 vs. 0.52 ± 0.04 eV) agree perfectly with the available experimental values, and CH 3 C* represents the most stable surface species. Under CO co-adsorption, the most stable surface species are the co-adsorbed CH 3 C*+H*+3CO*. It is found that CO co-adsorption promotes H 2 desorption and stabilizes CH 3 C* by blocking the surface sites for dissociation and raises the dissociation barrier compared to the clean surface (0.78 vs 0.54 eV). Brønsted–Evans–Polanyi relationship between the activation Gibbs free energy barrier and reaction Gibbs free energy is found for CH 2 C*+2H*+ n CO* = CH 3 C*+H*+ n CO* and CH 2 C*+2H*+ n CO* = HCC*+3H*+ n CO* ( n = 0–3). Ethylene adsorption has di-σ and π adsorption configurations in very close energy, and H 2 has adsorption energy of about 0.90 eV.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films