The Photoionization Investigations of Van Der Waals Cluster ArHCl

Li Yue,Wang Xiuyan,Zhang Xiaoguang,Li Lianbin,Lou Nanquan,Seng Liusi,Zhang Yunwu
DOI: https://doi.org/10.3866/pku.whxb19970408
1997-01-01
Acta Physico-Chimica Sinica
Abstract:The photoionization processes of van der Waals (vdW) cluster ArHCl in a molecular beam have been investigated by using synchrotron radiation light source and photoionization mass spectrometer. The results show that the concentration of the ArHCl dimer is approximately given by the equation: alpha(ArHCl)%=1.79x10(-8)p(o)(1.5). The PIE curve of ArHCl has been given for the first time. The appearance potential of ArHCl+ is determined to be 12.52 +/- 0.03eV. Using the IP values of HCl obtained in our experiment, the bond dissociation energy of ArHCl+ is deduced to be 0.22 +/- 0.03eV. The theoretical calculations using Gaussian-94w indicate that the value is about 0.16eV. When Ar in the cluster is ionized, the intensity of ArHCl+ is obviously lower than that expected. It indicates that the charge transfer and dissociation processes have taken place in the system.
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