Toward batch synthesis of high-quality graphene by cold-wall chemical vapor deposition approach
Kaicheng Jia,Ziteng Ma,Wendong Wang,Yongliang Wen,Huanxin Li,Yeshu Zhu,Jiawei Yang,Yuqing Song,Jiaxin Shao,Xiaoting Liu,Qi Lu,Yixuan Zhao,Jianbo Yin,Luzhao Sun,Hailin Peng,Jincan Zhang,Li Lin,Zhongfan Liu
DOI: https://doi.org/10.1007/s12274-022-4347-x
IF: 9.9
2022-04-30
Nano Research
Abstract:Chemical vapor deposition (CVD) has emerged as a promising approach for the controlled growth of graphene films with appealing scalability, controllability, and uniformity. However, the synthesis of high-quality graphene films still suffers from low production capacity and high energy consumption in the conventional hot-wall CVD system. In contrast, owing to the different heating mode, cold-wall CVD (CW-CVD) system exhibits promising potential for the industrial-scale production, but the quality of as-received graphene remains inferior with limited domain size and high defect density. Herein, we demonstrated an efficient method for the batch synthesis of high-quality graphene films with millimeter-sized domains based on CW-CVD system. With reduced defect density and improved properties, the as-received graphene was proven to be promising candidate material for electronics and anti-corrosion application. This study provides a new insight into the quality improvement of graphene derived from CW-CVD system, and paves a new avenue for the industrial production of high-quality graphene films for potential commercial applications.
materials science, multidisciplinary,chemistry, physical,physics, applied,nanoscience & nanotechnology