Abstract:The template for naoimprint lithography having a nano-sized structure was usually fabricated by traditional lithography such as extreme ultraviolet (EUV) lithography, focused ion beam (FIB) lithography, electron beam (EB) lithography. However, these approaches are always time-consuming and inefficiency which limits the potential application in nanoimprint lithography. To find a simple and low-cost method to fabricate the mold for nanoimprint lithography, and to improve the application in nanoimprint lithography have become the research focus. Instead of being formed by traditional lithography, the anodic aluminum oxide (AAO), with highly regular structures and high pore density, is the mold to achieve periodic structures for nanoimprint lithography. In this work, we successfully transfer a 2D nanoporous array structure to the Si surface via the nanoimprint lithography and AAO. The pore diameter and the interpore distance of the porous silicon (PS) are well consistent with that of AAO template. The interval, the diameter, and the height of the hexagonal array structure are 350-560 nm, 170-480 nm, and 200 nm, respectively. We have tested the Raman spectrum under the excitation by lasers of wavelength 514 nm. According to the results, two samples each exhibits a peak at 520 cm 1 and no frequency shift is observed with the Si characteristic Raman peak, indicating that the PS was not extensively damaged by the ICP etching process. Raman intensity in the structured Si is almost enhanced by a factor of 12 as compared with the case on polished Si, which will greatly benefit the application of Si-based optical devices. Thus, we have realized the replica of the PS template and obtained a nanopillar soft template via the hot embossing lithography.

Direct Surface Nanopatterning Using Pyramidal Silicon Nanopore Arrays As Templates

Optical Device Based on a Nanopillar Array by the Pattern Transfer of an Anodic Aluminum Oxide Membrane

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Large Area Assembly of Patterned Nanoparticles by a Polydimethylsiloxane Template

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Sustainable Fabrication and Transfer of High‐Precision Nanoparticle Arrays Using Recyclable Chemical Pattern Templates

A Method to Fabricate a Template with a Long Range Ordered Dense Array of True Nanometer Scale Pits

Particle Lithography-Based Patterning of Polyelectrolyte Template Films and Their Application in Fabrication of Gold/silver Nanoparticle Assembly.

Study on Porous Silicon Template for Nanoimprint Lithography

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Surface patterning using templates: concept, properties and device applications

Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

In Situ Chemical Patterning Technique

Large-Area Well-Ordered Nanodot Array Pattern Fabricated with Self-Assembled Nanosphere Template

Patterning of Plasmonic Nanoparticles into Multiplexed One-Dimensional Arrays Based on Spatially Modulated Electrostatic Potential

Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon

Templated I‐pvd of Metallic Nanodot Arrays

Solution-Phase Photochemical Nanopatterning Enabled by High-Refractive-Index Beam Pen Arrays

Large-scale fabrication of three-dimensional surface patterns using template-defined electrochemical deposition