Kinetic and Mechanistic Study of Microcystin-Lr Degradation by Nitrous Acid under Ultraviolet Irradiation

Qingwei Ma,Jing Ren,Honghui Huang,Shoubing Wang,Xiangrong Wang,Zhengqiu Fan
DOI: https://doi.org/10.1016/j.jhazmat.2012.02.033
IF: 13.6
2012-01-01
Journal of Hazardous Materials
Abstract:Degradation of microcystin-LR (MC-LR) in the presence of nitrous acid (HNO(2)) under irradiation of 365nm ultraviolet (UV) was studied for the first time. The influence of initial conditions including pH value, NaNO(2) concentration, MC-LR concentration and UV intensity were studied. MC-LR was degraded in the presence of HNO(2); enhanced degradation of MC-LR was observed with 365nm UV irradiation, caused by the generation of hydroxyl radicals through the photolysis of HNO(2). The degradation processes of MC-LR could well fit the pseudo-first-order kinetics. Mass spectrometry was applied for identification of the byproducts and the analysis of degradation mechanisms. Major degradation pathways were proposed according to the results of LC-MS analysis. The degradation of MC-LR was initiated via three major pathways: attack of hydroxyl radicals on the conjugated carbon double bonds of Adda, attack of hydroxyl radicals on the benzene ring of Adda, and attack of nitrosonium ion on the benzene ring of Adda.
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